Liquid Vaporizer Systems0 pages

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Data Sheet
Liquid Vaporizer
Systems
Systems and Solutions
Breakthrough Vaporization Solutions
for All Liquid-to-Vapor Applications
DLI Plate Mount
System
The Brooks family of extremely high-performing direct liquid injection (DLI) vaporizer
solutions is designed for customers who require reliable liquid vaporization. Featuring
unique atomization and heat exchanger technologies, Brooks direct liquid injection
vaporizers deliver pure vapor for every application. Applications include:
• Water vaporization for fuel cell stack humidification and many other water addition
applications
• Liquid precursor vaporization for chemical vapor deposition (CVD), metal oxide
chemical vapor deposition (MOCVD), and atomic layer deposition (ALD)
• Depositing thin films for enhanced thermal, optical, or hardness characteristics such as
diamond-like carbon coating and glass coating
• Vaporizing monomers for vacuum polymer film deposition
• Generating calibration vapor
• Vaporizing liquid hydrocarbons
• Many more.
Brooks' direct liquid injection vaporizer technology overcomes the many limitations of
conventional vaporizing technologies. Bubblers, or vapor draw systems, are difficult to
start and stop, require very close control of temperature and pressure, and are inefficient
at generating well controlled vapor mass flow. Vaporizing valves, hot frit, heat tracing, and
other "flash vaporizers" that apply heat to the liquid using a hot metal surface are also
inefficient at generating vapor mass and frequently can cause thermal decomposition of
the liquid precursor. None of these conventional technologies can eliminate the potential
for liquid carry-over and its attendant problems. Figure 1 on page 2 illustrates CVD
deposition chamber pressure fluctuations caused by incomplete vaporization and precursor
carry-over from a conventional vaporizer.
Furthermore, it is very challenging to determine precisely how much vapor mass is actually
being delivered from a conventional vaporizer. In applications that require precise vapor
mass addition, users must turn to secondary measurement/control devices such as vapor
mass flow controllers, increasing the cost and complexity of the vapor module.
Overview