Synthetic Silica Glass0 pages

Nikon NIFS Series Synthetic Silica Glass
NIFS Series ADVANTAGES
Nikon’s synthetic silica glass (SiO2) NIFS series is built around over 90 years experience in the field of optics. By combining
our critical process controls and leading metrology capabilities, we offer materials which meet and exceed our customers’
standard requirements. With our proprietary synthesis and annealing processes, we can optimize our glass to meet our
customers’ application requirements for homogeneity, birefringence and OH content. The NIFS series is the ideal choice for
OEM, R&D and special project requirements for Semiconductor lithography, High - power Nd:YAG, Astronomy, Medical and
FPD applications.

Optical grades
Internal transmittance [%]
Sample thickness 10 mm

Grade

Laser durability

Birefringence

99.9t 193 nm
a

NIFS-A

99.9t 193 nm
a

B

1 10 nm/cm

NIFS-U

99.9t 248 nm
a

C

on request

NIFS-S

99.9t 365 nm
a

ArF excimer laser nm
193

3D Free
1D Free
3D Free
1D Free
3D Free
1D Free

A

Recommended wavelength

3D Free

NIFS-V

Striae

ArF excimer laser nm
193
KrF excimer laser nm
248
UV region, Visible region

NIFS-I
Values stated above are valid for material with a diameter of 30350 mm and a thickness of 5 - 100 mm. Material outside this range will be regarded as custom.
Laser durability is classified into three groups, A, B and C, with NIFS-V represents the highest grade of material available.
Material available in Striae 3D Free (all directions) or in the required working direction (1D free).

NIFS Available range of homogeneity
< 0.5

<1

< 1.5

<2

<3

at 633 nm ppm
<4

<5

< 10

< 40

Not specified

NIFS-V
NIFS-A
NIFS-U
NIFS-S

NIFS Transmittance range
F2

ArF

KrF

i-line

g-line

157 nm

193 nm

248 nm

365 nm

436 nm

NIFS-V
NIFS-A
NIFS-U
NIFS-S

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