DC Generators TruPlasma DC Series 4000 (G2)0 pages
Brilliant Reflections: TRUMPF Hüttinger makes optical coatings shine.
Perfection in sight: Pulsed processes for spotless films.
TruPlasma DC Series 4000 (G2).
The TruPlasma DC Series 4000 (G2) power supplies are especially designed to serve reactive sputtering processes of difficult materials.
Whether PVD or PECVD, the generators prove themselves in critical
industrial plasma processes. These include solar cells manufacturing,
production of semiconductors and hard coating applications. At output powers ranging from 20 to 200 kilowatts (stackable), the generators deliver their maximum power across a wide load impedance
range. Fast DSP control allows thereby for stable processes and low
arc-time related losses.
TruPlasma DC Series 4000 (G2) combines the advantages of TRUMPF
Hüttinger‘s excellent arc management and DC pulse technology.
Thus reaching even less droplets and lower substrate damages in critical coating processes. Combined with an inherent very low stored
energy, this considerably improves the overall process quality and
production throughput.
Features
Benefits
Extremely low arc energy
Ultrafast digital control platform
Adjustable reverse voltage
Wide range of adjustable parameters:
frequency and pulse parameters
High sophisticated monitoring tools
Full water cooling
HUET_Prosp_TruPlasma_DC_Series_4000_G2_04-15_RZ.indd 1
High lm quality and production yield
Stable plasma and low arc-related time losses
Simple adoption to different process requirements
Allows for a wide range of applications with one device
Fast and easy process optimization
Compact size, easy system integration
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