ETNA HP0 pages

> Etna HP

Diode-Pumped Compact Series

FEATURES
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4 to 40 kHz operation
170 W at 532 nm
220 W at 1064 nm
Outstanding stability
M2 between 15 and 40
(on request)
• Compatible with industrial
environment

APPLICATIONS
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Femtosecond amplifier pumping
Industrial material processing
ITO ablation, Si annealing
Instrumentation
Scientific pump source for
non linear optics

Typical Etna HP beam profile
at 532 nm

www.thales-laser.com

The world reference for high average power Nd:YAG laser
Delivering more than 170 W of green power at 10 kHz, the Etna HP has
been developed to answer the most demanding industrial and scientific
applications.
Etna HP is based on THALES latest developments in diode pumping heads
renowned for their outstanding power stability.
Its unique specifications in terms of average power, beam quality and
stability make the Etna HP the world reference for pumping high repetition
rate Ti:Sa amplifiers.
Thanks to its outstanding stability, high specifications flexibility and its
maintenance free operation, the Etna HP works already successfully in
industrial environment for ITO ablation and Si annealing processes.